The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2017

Filed:

May. 18, 2012
Applicants:

Raluca Tiron, Saint-Martin le Vinoux, FR;

Stéphanie Gaugiran, Grenoble, FR;

Xavier Chevalier, Grenoble, FR;

Serge Tedesco, Corenc, FR;

Inventors:

Raluca Tiron, Saint-Martin le Vinoux, FR;

Stéphanie Gaugiran, Grenoble, FR;

Xavier Chevalier, Grenoble, FR;

Serge Tedesco, Corenc, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/00 (2006.01); B81C 1/00 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
B05D 5/00 (2013.01); B81C 1/00031 (2013.01); B81C 2201/0149 (2013.01); B81C 2201/0159 (2013.01); H01L 21/0273 (2013.01); H01L 21/0337 (2013.01);
Abstract

A method for making patterns on the surface of a substrate by graphoepitaxy, includes depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of a substrate; curing the patterns in the resin by producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of statistical copolymer after curing the patterns in the resin; grafting the layer of statistical copolymer onto the patterns in the resin by annealing; and depositing a layer of a block copolymer into the spaces defined by the patterns in the resin after curing the patterns and the grafting of the layer of statistical copolymer.


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