The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Oct. 19, 2012
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Khurshed Sorabji, San Jose, CA (US);
Joseph M. Ranish, San Jose, CA (US);
Wolfgang Aderhold, Cupertino, CA (US);
Aaron M. Hunter, Santa Cruz, CA (US);
Blake R. Koelmel, Mountain View, CA (US);
Alexander N. Lerner, San Jose, CA (US);
Nir Merry, Mountain View, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/324 (2006.01); H01L 21/68 (2006.01); H01L 21/687 (2006.01); C23C 16/46 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67259 (2013.01); C23C 16/46 (2013.01); H01L 21/324 (2013.01); H01L 21/67115 (2013.01); H01L 21/68 (2013.01); H01L 21/681 (2013.01); H01L 21/6835 (2013.01); H01L 21/68742 (2013.01);
Abstract
Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.