The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Jul. 28, 2015
Applicant:
Qualcomm Incorporated, San Diego, CA (US);
Inventors:
Lei Xu, San Diego, CA (US);
Yunke Pan, San Diego, CA (US);
Shuxue Quan, San Diego, CA (US);
Yingen Xiong, Mountain View, CA (US);
Ning Bi, San Diego, CA (US);
Assignee:
QUALCOMM Incorporated, San Diego, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2006.01); G06T 3/40 (2006.01); H04N 5/232 (2006.01); G06T 5/50 (2006.01); G06T 7/20 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0028 (2013.01); G06T 3/4038 (2013.01); G06T 5/50 (2013.01); G06T 7/0085 (2013.01); G06T 7/2033 (2013.01); H04N 5/23238 (2013.01); G06T 2200/32 (2013.01); G06T 2207/10016 (2013.01); G06T 2207/10024 (2013.01); G06T 2207/20136 (2013.01);
Abstract
A method performed by an electronic device is described. The method includes determining overlapping areas from neighboring images. The method also includes determining a difference measure between the overlapping areas. The method further includes determining a constraint measure corresponding to at least one of the overlapping areas. The method additionally includes determining a seam based on a combination of the difference measure and the constraint measure.