The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Sep. 26, 2014
Shanghai Tianma Micro-electronics Co., Ltd., Shanghai, CN;
Tianma Micro-electronics Co., Ltd., Shenzhen, CN;
Wenze Shan, Shanghai, CN;
Chen Liu, Shanghai, CN;
SHANGHAI TIANMA MICRO-ELECTRONICS CO., LTD., Shanghai, CN;
TIANMA MICRO-ELECTRONICS CO., LTD., Shenzhen, CN;
Abstract
An alignment method includes: (1) providing a substrate, applying a coating material formed from any two materials of aromatic dianhydrides, aromatic diamines or diamines containing biphenyl and hexyl in side groups; (2) sputtering a third material which is not coated in step (1) along a direction having an angle not equal to zero with the substrate for conducting a polymerization reaction with the two materials coated in step (1) to generate a reaction product; (3) thermally treating the reaction product. The diamine containing biphenyl and hexyl in side group reacts with the main group to form a side chain, and thus controls the pretilt angle while assisted with physical sputtering to sputter in a certain angle, thereby forming a pretilt direction.