The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
May. 16, 2014
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Joy Cheng, San Jose, CA (US);
Anindarupa Chunder, San Jose, CA (US);
Daniel P. Sanders, San Jose, CA (US);
Melia Tjio, San Jose, CA (US);
Ankit Vora, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 283/00 (2006.01); C09D 169/00 (2006.01); C08F 293/00 (2006.01);
U.S. Cl.
CPC ...
C08F 293/00 (2013.01); C09D 169/00 (2013.01);
Abstract
Block polymers are formed by ring opening polymerization (ROP) of a cyclic carbonate monomer using a polymeric initiator for the ROP that comprises repeating functionalized ethylene units. The block polymers are free of, or substantially free of, any polymer having a chemical structure that does not comprise the polymer backbone of the polymeric initiator. The block polymers are capable of directed self-assembly.