The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Feb. 22, 2013
Applicants:
Chang Min Lee, Uiwang-si, KR;
Seung Jib Choi, Uiwang-si, KR;
Ji Hye Kwon, Uiwang-si, KR;
Yeon Soo Lee, Uiwang-si, KR;
Kyoung Jin Ha, Uiwang-si, KR;
Inventors:
Chang Min Lee, Uiwang-si, KR;
Seung Jib Choi, Uiwang-si, KR;
Ji Hye Kwon, Uiwang-si, KR;
Yeon Soo Lee, Uiwang-si, KR;
Kyoung Jin Ha, Uiwang-si, KR;
Assignee:
Cheil Industries, Inc., Gumi-Si, Kyeongsangbuk, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 222/10 (2006.01); C08L 83/08 (2006.01); C09D 133/00 (2006.01); C08L 33/00 (2006.01); C08G 77/14 (2006.01); C08G 77/20 (2006.01); H01L 51/44 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
C08F 222/10 (2013.01); C08L 33/00 (2013.01); C08L 83/08 (2013.01); C09D 133/00 (2013.01); C08G 77/14 (2013.01); C08G 77/20 (2013.01); H01L 51/448 (2013.01); H01L 51/5253 (2013.01); Y10T 428/239 (2015.01);
Abstract
The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1.