The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2017

Filed:

Jan. 31, 2013
Applicant:

Covidien Lp, Mansfield, MA (US);

Inventor:

Alexey Sharonov, Bethany, CT (US);

Assignee:

Covidien LP, Mansfield, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 17/00 (2006.01); G01B 11/28 (2006.01); G01B 11/25 (2006.01); G02B 23/24 (2006.01);
U.S. Cl.
CPC ...
A61B 17/00234 (2013.01); G01B 11/2531 (2013.01); G02B 23/2461 (2013.01);
Abstract

An optical metrology and image correction device includes a point size light source adapted to emit a beam of light and a translucent mask that receive the beam of light. The translucent mask rotates from a first position wherein the beam of light is received by the translucent mask in a direction substantially orthogonal to the translucent mask to a second position wherein the beam of light is received by the translucent mask at an angle offset with respect to the translucent mask. A corresponding method of measuring and correcting an image from an optical metrology and image correction device includes emitting a beam of light from a point size light source, causing the beam of light to be received by a translucent mask in a first position substantially orthogonal to the mask and in a second position in a direction offset with respect to the translucent mask.


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