The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Feb. 18, 2016
Canon Kabushiki Kaisha, Tokyo, JP;
Koichiro Tsujita, Takarazuka, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides a formation method of forming, on a substrate, a fin pattern in which a plurality of linear fins are arrayed, the method comprising forming a resist pattern having a line-and-space shape on the substrate, wherein the substrate includes a first active region and a second active region adjacent to each other, and in the forming the resist pattern, the resist pattern is formed on the substrate such that an interval between a first fin and a second fin becomes wider than a pitch of the fins, the first fin being closest to a boundary of the first active region and the second active region out of the fins formed in the first active region, and the second fin being closest to the boundary out of the fins formed in the second active region.