The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2017

Filed:

Aug. 31, 2015
Applicant:

Hrl Laboratories, Llc, Malibu, CA (US);

Inventors:

Rongming Chu, Agoura Hills, CA (US);

Yu Cao, Agoura Hills, CA (US);

Assignee:

HRL Laboratories, LLC, Malibu, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/82 (2006.01); H01L 29/00 (2006.01); H01L 21/8238 (2006.01); H01L 27/092 (2006.01); H01L 29/20 (2006.01); H01L 29/06 (2006.01); H01L 23/535 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823807 (2013.01); H01L 23/535 (2013.01); H01L 27/092 (2013.01); H01L 29/0649 (2013.01); H01L 29/2003 (2013.01);
Abstract

A semiconductor device includes a substrate, a III-nitride buffer layer on the substrate, an N-channel transistor including a III-nitride N-channel layer on one portion of the buffer layer, and a III-nitride N-barrier layer for providing electrons on top of the N-channel layer, wherein the N-barrier layer has a wider bandgap than the N-channel layer, a P-channel transistor including a III-nitride P-barrier layer on another portion of the buffer layer for assisting accumulation of holes, a III-nitride P-channel layer on top of the P-barrier layer, wherein the P-barrier layer has a wider bandgap than the P-channel layer, and a III-nitride cap layer doped with P-type dopants on top of the P-channel layer.


Find Patent Forward Citations

Loading…