The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2017

Filed:

Jul. 21, 2015
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Seung-Taek Lee, Bucheon-si, KR;

Eun-Ji Kim, Seoul, KR;

Sin-Woo Kang, Suwon-si, KR;

Yeong-Lyeol Park, Yongin-si, KR;

Sung-Dong Cho, Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/308 (2006.01); H01L 21/3105 (2006.01); H01L 21/762 (2006.01); H01L 23/48 (2006.01); H01L 25/065 (2006.01); H01L 23/522 (2006.01); H01L 21/8234 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76898 (2013.01); H01L 21/3083 (2013.01); H01L 21/31053 (2013.01); H01L 21/762 (2013.01); H01L 21/76807 (2013.01); H01L 21/76834 (2013.01); H01L 23/481 (2013.01); H01L 23/5226 (2013.01); H01L 25/0657 (2013.01); H01L 21/823475 (2013.01); H01L 21/823481 (2013.01); H01L 23/53238 (2013.01); H01L 2224/73204 (2013.01);
Abstract

A semiconductor device includes a circuit device on a substrate and a first insulating interlayer on the substrate and covering the circuit device. An electrode structure extends through the first insulating interlayer and at least partially through the substrate. An etch-stop layer pattern is disposed on a sidewall of the electrode structure on a side of the first insulating layer opposite the substrate. A blocking layer pattern is disposed on the etch-stop layer pattern. The device further includes an interconnection structure including a via portion passing through the blocking layer pattern to contact the through electrode structure and a wiring portion on the via portion and having a different width than the via portion. The semiconductor device may further include a contact plug electrically connected to the circuit device through the first insulating interlayer. The contact plug and the through electrode structure may include different metals.


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