The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2017

Filed:

Jul. 15, 2013
Applicant:

Adixen Vacuum Products, Annecy, FR;

Inventor:

Bertrand Seigeot, Dingy Saint Clair, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F04B 49/00 (2006.01); H01L 21/67 (2006.01); F04B 37/14 (2006.01); F04C 23/00 (2006.01); F04C 25/02 (2006.01); F04C 28/02 (2006.01); F04F 5/20 (2006.01); B08B 9/032 (2006.01); F04C 18/12 (2006.01); F04C 28/24 (2006.01); F04C 29/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67011 (2013.01); B08B 9/0321 (2013.01); F04B 37/14 (2013.01); F04C 18/126 (2013.01); F04C 23/003 (2013.01); F04C 23/006 (2013.01); F04C 25/02 (2013.01); F04C 28/02 (2013.01); F04C 28/24 (2013.01); F04C 29/0092 (2013.01); F04F 5/20 (2013.01); F04C 29/0014 (2013.01); F04C 2220/30 (2013.01); Y10T 137/4259 (2015.04);
Abstract

A pumping device intended to be connected to a process chamber () includes a dry primary vacuum pump, an auxiliary pump mounted so that the auxiliary pump bypasses a check valve on the vacuum pump, a first valve device connected to a purging device for purging the dry primary vacuum pump and intended to be connected to a gas supply, a second valve device mounted so that the second valve device bypasses a check valve upstream from the auxiliary pump, and a controller configured to control the first and second valve devices on the basis of an operating status of the process chamber in such a way that the first valve device is at least partially closed and the second valve device is open when the process chamber is operating at ultimate vacuum. Also a method for pumping of a process chamber by way of such a pumping device.


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