The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Aug. 21, 2015
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Hajime Nagano, Yokkaichi, JP;
KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;
Abstract
In one embodiment, a semiconductor manufacturing apparatus includes an accommodation module configured to accommodate a substrate. The apparatus further includes a first flow channel including first openings configured to emit a first gas into the accommodation module. The apparatus further includes a second flow channel including second openings configured to emit the first gas into the accommodation module, a number or a size of the second openings being different from a number or a size of the first openings. The apparatus further includes a controller configured to control supplying of the first gas to the first and second flow channels such that the first gas is emitted from the first openings at a first flow velocity and the first gas is emitted from the second openings at a second flow velocity different from the first flow velocity.