The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Feb. 14, 2014
Tokyo Electron Limited, Tokyo, JP;
Satoko Yamamoto, Sapporo, JP;
Kimitoshi Miura, Yokohama, JP;
TOYKO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatus includes a substrate processing apparatus, including: a substrate processing chamber configured to accommodate a substrate and process the substrate; a piping coupled to the substrate processing chamber to allow a gas for processing the substrate to be introduced therethrough; and a simulation apparatus configured to simulate a path in which the gas for processing the substrate flows through the piping. The simulation apparatus includes: an information acquisition unit configured to acquire gas flow information defined by an operation mode in which the substrate is processed; a path determination unit configured to determine a gas path based on the gas flow information acquired by the information acquisition unit; and a simulation unit configured to simulate a flow of the gas by putting a color defined according to the type of gas on the gas path determined by the path determination unit.