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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9557659 B1

PDFFull Text
Date of Patent:
Jan. 31, 2017

Filed:

Oct. 10, 2014

Lithography apparatus, determination method, and method of manufacturing article

Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Kazushi Mizumoto, Utsunomiya, JP;

Assignee:

CANON KABUSHIKI KAISHA, Tokyo, JP;

Attorney:

Rossi, Kimms & McDowell LLP

Primary Examiner:

Colin Kreutzer

Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/58 (2006.01); G03B 27/60 (2006.01); G03B 27/62 (2006.01); G03B 27/64 (2006.01); G03F 7/20 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7075 (2013.01); G03F 7/707 (2013.01); H01L 21/6838 (2013.01);
Abstract

The present invention provides a lithography apparatus which forms a pattern on a substrate, including a stage configured to hold the substrate, a substrate transport system configured to transfer the substrate to the stage, an obtaining unit configured to obtain information about a holding state of the substrate on the stage, and a processor configured to perform processing of determining a transport position on the stage when the substrate transport system transfers the substrate to the stage, wherein based on information obtained by the obtaining unit when the stage holds the substrate at each of a plurality of positions on the stage, the processor determines the transport position at which the substrate transport system transfers the substrate to the stage.

Find Patent Forward Citations

Mizumoto, Kazushi. (2017). Lithography apparatus, determination method, and method of manufacturing article (U.S. Patent No. 9557659). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9557659

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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