The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Mar. 14, 2014
Applicant:
Si-ware Systems, Cairo, EG;
Inventors:
Assignee:
SI-WARE SYSTEMS, Cairo, EG;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/24 (2006.01); G02B 26/00 (2006.01); G01B 9/02 (2006.01); G01J 1/04 (2006.01); G02B 6/35 (2006.01); G02B 26/02 (2006.01); G02B 6/36 (2006.01); G02B 6/26 (2006.01); G02B 6/293 (2006.01); B81B 5/00 (2006.01); G02B 1/00 (2006.01);
U.S. Cl.
CPC ...
G02B 26/001 (2013.01); B81B 5/00 (2013.01); G01B 9/02049 (2013.01); G01J 1/0411 (2013.01); G02B 6/24 (2013.01); G02B 6/262 (2013.01); G02B 6/29368 (2013.01); G02B 6/29395 (2013.01); G02B 6/353 (2013.01); G02B 6/357 (2013.01); G02B 6/3514 (2013.01); G02B 6/3518 (2013.01); G02B 6/3584 (2013.01); G02B 6/3616 (2013.01); G02B 26/02 (2013.01); G02B 26/023 (2013.01); G02B 1/005 (2013.01);
Abstract
An integrated apertured micromirror is provided in which the micromirror is monolithically integrated with a micro-optical bench fabricated on a substrate using a lithographic and deep etching technique. The micromirror has an aperture therein and is oriented such that the micromirror is optically coupled to receive an incident beam having an optical axis in a plane of the substrate and to at least partially transmit the incident beam therethrough via the aperture.