The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2017

Filed:

Aug. 17, 2011
Applicants:

Teruyuki Nishimura, Matsumoto, JP;

Akira Sano, Shiojiri, JP;

Seiji Yamazaki, Fujimi, JP;

Inventors:

Teruyuki Nishimura, Matsumoto, JP;

Akira Sano, Shiojiri, JP;

Seiji Yamazaki, Fujimi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01);
U.S. Cl.
CPC ...
G02B 26/001 (2013.01);
Abstract

An etalon includes a fixed mirror disposed on a first substrate, a movable mirror disposed on a second substrate to face the fixed mirror with a gap interposed therebetween, a first electrode disposed on the surface of the first substrate facing the second substrate, a second electrode disposed on a first surface of the second substrate facing the first substrate and separated from the first electrode, and a warp preventing film disposed on a second surface of the second substrate so as to cover at least the movable mirror in a plan view. The direction of an internal stress acting in the in-plane direction of the warp preventing film is parallel to the direction of an internal stress acting in the in-plane direction of the movable mirror and the second electrode.


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