The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2017

Filed:

Jul. 05, 2012
Applicant:

Harry Marth, Waldbronn, DE;

Inventor:

Harry Marth, Waldbronn, DE;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 7/04 (2006.01); G02B 21/24 (2006.01);
U.S. Cl.
CPC ...
G02B 7/04 (2013.01); G02B 21/242 (2013.01); G02B 21/244 (2013.01);
Abstract

The invention relates to a method and to an arrangement for operating a dynamic nano focusing system for use thereof in the field of microscopy, interferometry or similar applications, wherein the nano focusing system comprises a lever-transmission piezo actuator and a frictionless guide based on a resiliently deformable solid body joint which is connected to a mounting unit, in particular for a lens, in order to implement the desired adjustment paths for the focusing. According to the invention, in order to increase the dynamics during the focusing process, a secondary fine adjustment movement is superimposed on the primary adjustment movement, said secondary fine adjustment movement having a smaller adjustment path but higher frequency than the primary adjustment movement, wherein, when the fine adjustment is carried out, a determination is made as to whether the focusing result changes, in order to specify according thereto the amount and/or the direction of the primary adjustment movement.


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