The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2017

Filed:

Mar. 13, 2013
Applicant:

Mohammad Saghir Munir, Union City, CA (US);

Inventor:

Mohammad Saghir Munir, Union City, CA (US);

Assignee:

RETICLE LABS LLC, Palo Alto, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01C 9/00 (2006.01); G01B 21/20 (2006.01); G01B 11/24 (2006.01); G01N 21/95 (2006.01); G03F 1/84 (2012.01);
U.S. Cl.
CPC ...
G01B 21/20 (2013.01); G01B 11/24 (2013.01); G01N 21/9501 (2013.01); G03F 1/84 (2013.01);
Abstract

This invention allows tracking of a defect across multiple inspections. The inventive solution translates every inspection record into a common set of fields that are first archived into a relational database. Then the defect coordinates from the inspection records of the same mask are all transformed into a common reference frame having the same origin and orientation with respect to the mask coordinate system. Following this, the defect having coordinates within a given tolerance distance are paired up and reported to the user.


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