The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2017
Filed:
Apr. 17, 2014
Escape Therapeutics, Inc.;
Basil M. Hantash, Hughson, CA (US);
Escape Therapeutics, Inc., San Jose, CA (US);
Abstract
A system allows determining treatment parameters or sets of parameters applicable to electromagnetic radiation (EMR)-based device skin treatments that allow for upregulation of the sirtuin family of genes post treatment, while avoiding increasing collagen production. The system can be applied to other skin procedures, including chemical treatments, microdermabrasion treatments and others. The system includes classifying patient data into classifications of skin treatment and treatment parameters based on patient baseline levels. The system can determine effective treatment parameters for patients on an individual basis, to yield a healthy wound dealing response. In a specific implementation, the system determines the parameters of EMR and chemical based treatments that increase sirtuin gene expression post treatment, but do not induce collagen production.