The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Sep. 16, 2013
Koninklijke Philips N.v., Eindhoven, NL;
Jeroen Jan Lambertus Horikx, Weert, NL;
Gert Wo 'T Hooft, Eindhoven, NL;
Milan Jan Henri Marell, Noord Brabant, NL;
Koninklijke Philips N.V., Eindhoven, NL;
Abstract
There is presented an optical frequency domain reflectometry (OFDR) system () comprising a first coupling point () arranged for splitting radiation into two parts, so that radiation may be emitted into a reference path () and a measurement path (). The system further comprises an optical detection unit () capable of obtaining a signal from the combined optical radiation from the reference path and the measurement path via a second coupling point (). The measurement path () comprises a polarization dependent optical path length shifter (PDOPS, PDFS,), which may create a first polarization (PI) and a second polarization (P) for the radiation in the measurement path, where the optical path length is different for the first and second polarizations in the measurement path. This may be advantageous for obtaining an improved optical frequency domain reflectometry (OFDR) system where e.g. the two measurements for input polarizations may be performed in the same scan of a radiation source.