The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Jul. 25, 2013
Horiba Jobin Yvon Sas, Longjumeau, FR;
Olivier Acher, Gif sur Yvette, FR;
Simon Richard, Villebon sur Yvette, FR;
Thanh-Liem Nguyen, Meudon, FR;
HORIBA JOBIN YVON SAS, Longjumeau, FR;
Abstract
An accurate and robust wavefront-division polarimetric analysis method and device, allows the quasi-instantaneous measurement of the polarization states of a luminous object. The device can be used to produce a plurality of light beams, all polarized according to different polarization states, from a single upstream light beam. The polarized light beams, which do not overlap and which carry information items that are complementary in terms of polarization, are analyzed simultaneously by a plurality of detectors that measure the luminous intensity of each beam. Processing elements digitally process the luminous intensity values obtained in order to determine the polarization state of the upstream light beam. The operations performed by the processing elements prevent luminous intensity variations in the split light beams during the division of the wavefront of the upstream light beam. Therefore, the wavefront-division polarimetric analysis device is robust and its accuracy is not hindered by the experimental conditions.