The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Oct. 19, 2011
Applicants:
Ravinder Aggarwal, Gilbert, AZ (US);
Jeroen Stoutjesdijk, Bussum, NL;
Inventors:
Ravinder Aggarwal, Gilbert, AZ (US);
Jeroen Stoutjesdijk, Bussum, NL;
Assignee:
ASM AMERICA, INC., Phoenix, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); C23C 16/455 (2013.01); C23C 16/458 (2013.01); C23C 16/4582 (2013.01); C23C 16/4583 (2013.01); C23C 16/4584 (2013.01); C23C 16/45502 (2013.01); C23C 16/45563 (2013.01); C23C 16/45504 (2013.01);
Abstract
A reaction apparatus for a semiconductor fabrication apparatus, wherein the reaction apparatus includes at least two adjustable outlet ports for withdrawing reactant gases from the reaction chamber. Adjustment of the flow rate through each of the outlet ports selectively modifies the flow pattern of the reactant gases within the reaction chamber to maintain a desired flow pattern therewithin, such as a substantially uniform flow over the surface of a substrate being processed, and/or minimization of turbulence within the reactor.