The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
Apr. 18, 2013
Applicant:
Sulzer Metaplas Gmbh, Bergisch Gladbach, DE;
Inventors:
Assignee:
OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON, Pfaeffikon, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/00 (2006.01); C23C 14/06 (2006.01); C23C 14/32 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3485 (2013.01); C23C 14/0068 (2013.01); C23C 14/0084 (2013.01); C23C 14/06 (2013.01); C23C 14/325 (2013.01); C23C 14/3471 (2013.01); C23C 14/3492 (2013.01); C23C 14/35 (2013.01); Y10T 428/265 (2015.01);
Abstract
The invention relates to a coating method for depositing a layer system formed from hard material layers on a substrate, by depositing at least one contact layer including the evaporation material on the surface of the substrate only by means of a cathodic vacuum arc evaporation source. After the depositing of the contact layer, at least one intermediate layer is deposited in the form of a nano-layer intermediate layer in a hybrid phase or as a nanocomposite layer, including the evaporation material and the discharge material, by parallel operation of a cathodic vacuum arc evaporation source and of a magnetron discharge source.