The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2017
Filed:
May. 29, 2015
Applicants:
Juergen Erwin Lang, Karlsruhe, DE;
Hartwig Rauleder, Rheinfelden, DE;
Ekkehard Mueh, Rheinfelden, DE;
Inventors:
Juergen Erwin Lang, Karlsruhe, DE;
Hartwig Rauleder, Rheinfelden, DE;
Ekkehard Mueh, Rheinfelden, DE;
Assignee:
EVONIK DEGUSSA GmbH, Essen, DE;
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); C01B 21/068 (2006.01); C01B 21/082 (2006.01); C01B 31/30 (2006.01); C01B 33/04 (2006.01); C01B 33/107 (2006.01); C01B 33/12 (2006.01); C01B 33/36 (2006.01); C01G 17/00 (2006.01); C07F 7/08 (2006.01); C07F 7/30 (2006.01);
U.S. Cl.
CPC ...
B01J 19/088 (2013.01); C01B 21/068 (2013.01); C01B 21/0823 (2013.01); C01B 31/301 (2013.01); C01B 33/04 (2013.01); C01B 33/107 (2013.01); C01B 33/12 (2013.01); C01B 33/36 (2013.01); C01G 17/00 (2013.01); C07F 7/083 (2013.01); C07F 7/30 (2013.01); B01J 2219/0803 (2013.01); B01J 2219/0894 (2013.01); C01P 2002/86 (2013.01);
Abstract
An apparatus for preparing dimeric and trimeric silicon compounds is provided. The apparatus includes a reactor for generating a nonthermal plasma; a collecting vessel in product flow communication with the nonthermal plasma reactor; and a series of at least three rectification columns in flow communication with the collecting vessel.