The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2017

Filed:

Jan. 27, 2016
Applicant:

The Board of Regents of the University of Oklahoma, Norman, OK (US);

Inventors:

Miguel Bagajewicz, Norman, OK (US);

Quang Nguyen, Norman, OK (US);

Tu Oanh Tran, Norman, OK (US);

Conner Cruson, Norman, OK (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 53/14 (2006.01); C10L 3/10 (2006.01);
U.S. Cl.
CPC ...
B01D 53/1462 (2013.01); B01D 53/1425 (2013.01); C10L 3/103 (2013.01); C10L 3/104 (2013.01); C10L 3/105 (2013.01); C10L 3/108 (2013.01); B01D 2252/103 (2013.01); C10L 2290/06 (2013.01); C10L 2290/10 (2013.01); C10L 2290/12 (2013.01); C10L 2290/48 (2013.01); C10L 2290/541 (2013.01); C10L 2290/543 (2013.01); C10L 2290/545 (2013.01);
Abstract

A method of treating natural gas to remove contaminants is described. An input natural gas is mixed with water causing formation of COhydrates and CHhydrates. A natural gas having a reduced COconcentration, and a water-hydrate mixture comprising the COhydrates and CHhydrates, is output. The water-hydrate mixture is exposed to COgas forming a CO—CHgas mixture and a residual hydrate mixture. The CO—CHgas mixture is recycled to remove CH. The residual hydrate mixture is treated to produce HO which can be recycled for use in forming the water-hydrate mixture, and gaseous COfor use in use in stripping CHfrom the CHhydrates of the water-hydrate mixture.


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