The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 2017

Filed:

Jun. 24, 2015
Applicant:

Airbus Defence and Space Gmbh, Ottobrunn, DE;

Inventors:

Bernhard Schoenlinner, Munich, DE;

Ulrich Prechtel, Munich, DE;

Thomas Schuster, Nersingen, DE;

Michael Sabielny, Ulm, DE;

Herbert Zippold, Bruckmuehl, DE;

Kay W. Dittrich, Ingolstadt, DE;

Franz Stadler, Boehmfeld, DE;

Markus Rothenhaeusler, Pfaffenhofen, DE;

Wilhelm Wulbrand, Markdorf, DE;

Thomas Koerwien, Hoehenkirchen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 1/42 (2006.01); H01Q 15/14 (2006.01); H01Q 1/40 (2006.01); H01Q 1/28 (2006.01); H01Q 1/32 (2006.01); H01Q 1/38 (2006.01); H01Q 3/08 (2006.01);
U.S. Cl.
CPC ...
H01Q 1/42 (2013.01); H01Q 15/141 (2013.01); H01Q 1/28 (2013.01); H01Q 1/3275 (2013.01); H01Q 1/38 (2013.01); H01Q 1/40 (2013.01); H01Q 1/422 (2013.01); H01Q 3/08 (2013.01); Y02T 50/433 (2013.01);
Abstract

A method is provided for manufacturing a radome. The method has the following steps: creation of a contoured fit of at least one section of an inner surface of a wall of the radome; arrangement of a plurality of planar photosensitive semiconductor elements on an outer surface of the contoured fit; placement of the contoured fit with the plurality of planar photosensitive semiconductor elements on the at least one section of the inner surface of the wall; establishing of a connection between the plurality of planar photosensitive semiconductor elements and the wall; and removal of the contoured fit from the radome. This method enables the simple manufacture of a radome with a layer having several semiconductor elements for the electromagnetic shielding of the interior of the radome.


Find Patent Forward Citations

Loading…