The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Apr. 24, 2015
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Stmicroelectronics (Crolles 2) Sas, Crolles, FR;
Fabrice Nemouchi, Moirans, FR;
Emilie Bourjot, Grenoble, FR;
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris, FR;
STIMICROELECTRONICS (CROLLES 2) SAS, Crolles, FR;
Abstract
Fabrication of a field-effect transistor is performed on a substrate comprising a film made from first semiconductor material, a gate dielectric covered by a gate electrode, source and drain areas separated by the gate electrode, a protection layer covering gate electrode and source and drain areas, and an access hole to the source area and/or to drain area. Metallic material is deposited in the access hole in contact with the first semiconductor material of the source and/or drain area. An electrically conducting barrier layer that is non-reactive with the first semiconductor material and with the metallic material is deposited before reaction of metallic material with first semiconductor material. Transformation heat treatment of the metallic material with the semiconductor material is performed to form a metallic material having a base formed by the semiconductor material generating a set of stresses on a conduction channel arranged between the source and drain areas.