The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Mar. 14, 2013
Applicant:
Hgst Netherlands B.v., Amsterdam, NL;
Inventors:
Assignee:
HGST NETHERLANDS B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 21/00 (2006.01); G11B 5/23 (2006.01); G11B 5/127 (2006.01); G11B 5/31 (2006.01);
U.S. Cl.
CPC ...
G11B 5/232 (2013.01); G11B 5/1278 (2013.01); G11B 5/3116 (2013.01); G11B 5/3163 (2013.01);
Abstract
The present invention generally relates to a method for forming a smooth gap of a damascene write pole. An opening having a side wall with a first angle with respect to vertical is formed in a fill layer, and a first non-magnetic layer is deposited into the opening by ion beam deposition. The ion beam is delivered to the side wall at a second angle with respect to vertical. The ratio of the first angle to the second angle ranges from about 250 to about 3.5.