The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Aug. 04, 2014
Canon Kabushiki Kaisha, Tokyo, JP;
Yasumi Tanaka, Funabashi, JP;
Colin Fahey, Irvine, CA (US);
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A plurality of types of arrangement pattern candidates are generated. Each arrangement pattern candidate is an arrangement pattern candidate of a plurality of indices in a physical space used to calculate the position and orientation of the viewpoint. The arrangement pattern candidate enables observation of a predetermined number or more of indices from a position in an area where mixed reality can be experienced in the physical space. Information representing the arrangement pattern of a plurality of indices in the physical space is generated by using the generated types of arrangement pattern candidates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile