The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Sep. 28, 2015
Google Inc., Mountain View, CA (US);
Eunyoung Kim, Mountain View, CA (US);
Ronald Frank Wotzlaw, Mountain View, CA (US);
Google Inc., Mountain View, CA (US);
Abstract
Implementations relate to feature mask determination for images. In some implementations, a computer-implemented method to determine a feature mask for an image includes estimating one or more prior regions in the image that define a feature in the image. The method determines superpixels based on multiple pixels of the image similar in color. The method constructs a graph, each node of the graph corresponding to a superpixel, and determines a superpixel score for each superpixel based on a number of pixels of the superpixel. The method determines one or more segmented regions in the image based on applying a graph cut technique to the graph based at least on the superpixel scores, and determines the feature mask based on the segmented regions. The feature mask indicates a degree to which pixels of the image depict the feature. The method modifies the image based on the feature mask.