The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Jan. 06, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
Atsushi Ito, Long Beach, CA (US);
Nobushige Korenaga, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides a lithography apparatus which forms a pattern on a substrate, the apparatus including an optical unit including a plurality of optical systems each of which irradiates the substrate with a beam for forming the pattern and which are arranged in at least one of a first direction and a second direction orthogonal to an optical axis thereof, and a pair of interferometers configured to measure a rotation angle of the optical unit around an axis parallel to the optical axis, wherein a distance between measurement axes of the pair of interferometers is not small than longer one of a distance between optical axes of two optical systems, of the plurality of optical systems, farthest away from each other in the first direction and a distance between optical axes of two optical systems, of the plurality of optical systems, farthest away from each other in the second direction.