The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Dec. 17, 2014
Applicant:
Amazon Technologies, Inc., Seattle, WA (US);
Inventors:
Assignee:
Amazon Technologies, Inc., Seattle, WA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02B 26/02 (2006.01); G02B 1/10 (2015.01); G02B 1/12 (2006.01); G09G 3/34 (2006.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
G02B 26/005 (2013.01); G02B 1/10 (2013.01); G02B 1/12 (2013.01); G02B 26/004 (2013.01); G02B 26/02 (2013.01); G09G 3/3433 (2013.01); B01L 2400/04 (2013.01); B01L 2400/0427 (2013.01); G02B 5/201 (2013.01); G09G 3/348 (2013.01); G09G 2300/0452 (2013.01);
Abstract
A method for fabricating an electrowetting display may include disposing an etching barrier on a substrate to delineate a first region and a second region of the substrate, the etching barrier covering the second region of the substrate; etching the first region of the substrate to form an etched first region of the substrate, wherein at least a portion of the second region of the substrate is a protrusion formed in response to the etching of the first region; removing the etching barrier; disposing a black matrix on the second region of the substrate; and forming a spacer over the black matrix disposed on the second region of the substrate.