The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 2017

Filed:

Dec. 27, 2012
Applicants:

Jeffrey A. Barnes, Bethlehem, CT (US);

Emanuel I. Cooper, Scarsdale, NY (US);

Li-min Chen, Norwalk, CT (US);

Steven Lippy, Brookfield, CT (US);

Rekha Rajaram, White Plains, NY (US);

Sheng-hung Tu, Danbury, CT (US);

Inventors:

Jeffrey A. Barnes, Bethlehem, CT (US);

Emanuel I. Cooper, Scarsdale, NY (US);

Li-Min Chen, Norwalk, CT (US);

Steven Lippy, Brookfield, CT (US);

Rekha Rajaram, White Plains, NY (US);

Sheng-Hung Tu, Danbury, CT (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01B 13/00 (2006.01); C09K 13/10 (2006.01); H01L 21/3213 (2006.01); C09K 13/00 (2006.01); C09K 13/06 (2006.01); C09K 13/08 (2006.01); C23F 1/02 (2006.01); C23F 1/30 (2006.01); C23F 1/40 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
C09K 13/10 (2013.01); C09K 13/00 (2013.01); C09K 13/06 (2013.01); C09K 13/08 (2013.01); C23F 1/02 (2013.01); C23F 1/30 (2013.01); C23F 1/40 (2013.01); H01L 21/02063 (2013.01); H01L 21/32134 (2013.01); H01L 21/31144 (2013.01);
Abstract

Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant and one etchant, may contain various corrosion inhibitors to ensure selectivity.


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