The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Apr. 30, 2015
Applicant:
Avon Products, Inc., Suffern, NY (US);
Inventors:
Satish Parimoo, Bridgewater, NJ (US);
Nancy T. Ilaya, New York, NY (US);
John W. Lyga, Basking Ridge, NJ (US);
Assignee:
AVON PRODUCTS, INC., New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61K 31/415 (2006.01); A61Q 19/08 (2006.01); A61P 17/02 (2006.01); A61K 8/49 (2006.01); A61K 9/00 (2006.01); A61Q 19/00 (2006.01);
U.S. Cl.
CPC ...
A61K 8/494 (2013.01); A61K 8/49 (2013.01); A61K 9/0014 (2013.01); A61Q 19/007 (2013.01); A61Q 19/08 (2013.01); A61K 2800/10 (2013.01);
Abstract
Cosmetic and dermatological compositions comprising N-heteroarylbisamide analogs and methods of using such compositions to impart anti-aging benefits to the skin and/or improve skin conditions resulting from reduced collagen and hyaluronic acid production are disclosed. The N-heteroarylbisamides are believed to stimulate collagen and hyaluronic acid production and restore or maintain homeostasis for these compounds.