The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Mar. 25, 2014
Applicant:
Sony Corporation, Minato-ku, JP;
Inventors:
Chao Huang, Esslingen, DE;
Oliver Erdler, Ostfildern, DE;
Assignee:
Sony Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H04N 19/14 (2014.01); H04N 19/51 (2014.01); H04N 5/14 (2006.01); G06T 7/20 (2006.01); H04N 19/172 (2014.01); H04N 19/117 (2014.01); H04N 19/192 (2014.01); H04N 7/01 (2006.01);
U.S. Cl.
CPC ...
H04N 19/51 (2014.11); G06T 7/2013 (2013.01); H04N 5/145 (2013.01); G06T 2207/10016 (2013.01); H04N 7/014 (2013.01); H04N 7/0127 (2013.01); H04N 19/117 (2014.11); H04N 19/14 (2014.11); H04N 19/172 (2014.11); H04N 19/192 (2014.11);
Abstract
The present disclosure relates to a method for improving an estimation process, comprising providing an image; detecting a failure area within said image to obtain a failure area map; obtaining a motion or disparity estimation map containing estimation vectors determined in an estimation process; providing a local direction model, LDM, map comprising LDM vectors determined on the basis of said estimated vectors and said detected failure area, and adjusting said estimation process dependent on the local direction model map.