The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Aug. 26, 2015
Novatek Microelectronics Corp., Hsin-Chu, TW;
Kai-Wen Wang, Taoyuan, TW;
Qingjie Chen, Shanghai, CN;
Shaoxiong Li, Xi'an, CN;
Yen-Hsi Lee, Taichung, TW;
Jia-Xiu Liu, Hsinchu, TW;
NOVATEK Microelectronics Corp., Hsin-Chu, TW;
Abstract
An image processing method includes acquiring a first image during a first exposure time, and a second image during a second exposure time, wherein the first exposure time is smaller than the second exposure time; acquiring the image region with the luminance greater than a first threshold in the second image as a first over-exposure region; acquiring the image region located at corresponding positions of the first over-exposure region and in the first image as a second over-exposure region; comparing the second over-exposure region and the first over-exposure region, for acquiring a first moving-object region; excluding the first moving-object region from the second over-exposure region, to generate a third over-exposure region; acquiring the image region located at corresponding positions of the third over-exposure region and in the second image as a fourth over-exposure region; and combining the third over-exposure region and the fourth over-exposure region.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile