The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2017

Filed:

Jan. 21, 2016
Applicant:

Innolux Corporation, Chu-Nan, Miao-Li County, TW;

Inventors:

Yueh-Ting Chung, Chu-Nan, TW;

Jyun-Yu Chen, Chu-Nan, TW;

Wei-Chen Hsu, Chu-Nan, TW;

Yung-Hsin Lu, Chu-Nan, TW;

Chao-Hsiang Wang, Chu-Nan, TW;

Kuan-Yu Chiu, Chu-Nan, TW;

Assignee:

INNOLUX CORPORATION, Jhu-nan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G02F 1/1362 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
H01L 27/124 (2013.01); G02F 1/136227 (2013.01); H01L 27/1222 (2013.01); H01L 27/1225 (2013.01); G02F 2001/133357 (2013.01); G02F 2201/40 (2013.01);
Abstract

An element substrate is provided, including a substrate, a metal layer and a planarization layer. The metal layer is located on the substrate. The metal layer has a first edge in a first direction. The planarization layer is located on the metal layer. The planarization layer includes a contact hole. The contact hole has a contiguous wall and a bottom side. The metal layer is exposed in the bottom side. A contour line of the contiguous wall on a vertical plane is a curved line. The first edge corresponds vertically with a critical point on the contour line. The slope of a tangent line on the critical point of the contour line is between 0.087 to 0.364.


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