The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Feb. 27, 2015
Applicant:
Tdk Corporation, Tokyo, JP;
Inventors:
Assignee:
TDK Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65D 85/00 (2006.01); H01L 21/673 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67393 (2013.01); H01L 21/67772 (2013.01);
Abstract
An object is to prevent the partial pressure of oxidative gas over time in an FOUP mounted on an FIMS system and left open. A surface purge unit is provided on a side opposite to the opening of the FOUP in such a way that wafers supported in the FOUP is located between the opening and the surface purge unit. The surface purge unit ejects inert gas from a plurality of vent holes provided in its surface toward the opening. Uniform purging or replacement of the interior of the FOUP with inert gas can be achieved by creating inert gas flow from an inert gas supply part extending over a surface in the direction from the interior of the FOUP toward the opening along the wafer surface.