The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Dec. 26, 2013
Lg Display Co., Ltd., Seoul, KR;
Bayer Materialscience Ag, Leverkusen, DE;
Hyungseok Bang, Goyang-si, KR;
Heejin Im, Paju-si, KR;
Guensik Lee, Seoul, KR;
Friedrich-Karl Bruder, Krefeld, DE;
Thomas Peter Fäcke, Leverkusen, DE;
Marc-Stephan Weiser, Leverkusen, DE;
Rainer Hagen, Leverkusen, DE;
Thomas Rölle, Leverkusen, DE;
Horst Berneth, Leverkusen, DE;
Dennis Hönel, Zülpich, DE;
Günther Walze, Köln, DE;
LG Display Co., Ltd., Seoul, KR;
Bayer MaterialScience AG, Leverkusen, DE;
Abstract
The present disclosure relates to a method for producing a beam shaping holographic optical element, which is configured to generate diffracted beams configured to reconstruct an image of a diffusor irrespectively of the point of impact of a pencil of light on the beam shaping holographic optical element, comprising providing a recording element, providing a master element comprising a particular pattern, forming a recording stack comprising the recording element and the master element such that the master element is arranged to the recording element in a closed-copy distance, irradiating at least a part of the recording stack with a reconstruction beam, irradiating at least a part of the recording stack with a reference beam, wherein at least one of the reconstruction beam or reference beam penetrates the master element to record the pattern of the master element onto the recording element.