The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Nov. 25, 2013
Applicant:
Boe Technology Group Co., Ltd., Beijing, CN;
Inventor:
Xuelan Wang, Beijing, CN;
Assignee:
BOE Technology Group Co., Ltd., Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/032 (2006.01); G03F 7/027 (2006.01); G03F 7/11 (2006.01); G03F 7/004 (2006.01); C08G 65/332 (2006.01); C07C 15/50 (2006.01); C07C 15/54 (2006.01); C08G 65/48 (2006.01); G03F 7/09 (2006.01); G03F 7/00 (2006.01); G02B 5/20 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C07C 15/50 (2013.01); C07C 15/54 (2013.01); C08G 65/332 (2013.01); C08G 65/48 (2013.01); G03F 7/004 (2013.01); G03F 7/027 (2013.01); G03F 7/094 (2013.01); G02B 5/20 (2013.01); G03F 7/0007 (2013.01); H01L 21/0271 (2013.01);
Abstract
A polyether compound which is as shown in Formula (I), wherein Ris a polyether backbone of the polyether polyol; Ris hydrogen or C˜Calkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.