The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Jan. 03, 2013
Yoav Levy, Hinanit, IL;
Arik Hananel, Charlottesville, VA (US);
David Freundlich, Haifa, IL;
Gilad Halevy, Modi'in, IL;
Benny Assif, Ramat HaSharon, IL;
Hadas Ziso, Kiryat Tivon, IL;
Yoav Levy, Hinanit, IL;
Arik Hananel, Charlottesville, VA (US);
David Freundlich, Haifa, IL;
Gilad Halevy, Modi'in, IL;
Benny Assif, Ramat HaSharon, IL;
Hadas Ziso, Kiryat Tivon, IL;
Insightec, Ltd., Tirat Carmel, IL;
Abstract
Techniques for correcting measurement artifacts in MR thermometry predict or anticipate movements of objects in or near an MR imaging region that may potentially affect a phase background and then acquire a library of reference phase images corresponding to different phase backgrounds that result from the predicted movements. For each phase image subsequently acquired, one reference phase image is selected from the library of reference phase images to serve as the baseline image for temperature measurement purposes. To avoid measurement artifacts that arise from phase wrapping, the phase shift associated with each phase image is calculated incrementally, that is, by accumulating phase increments from each pair of consecutively scanned phase images.