The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Jul. 23, 2014
Beijing Nmc Co., Ltd., Beijing, CN;
Liqiang Yao, Beijing, CN;
Beijing NMC Co., Ltd., Beijing, CN;
Abstract
A gas distribution apparatus for a plasma processing equipment is provided. The gas distribution apparatus includes a support plate () and a showerhead electrode () that are secured together parallelly to define a chamber for gas distribution. A first gas distribution plate () is arranged in the chamber horizontally. On an upper surface of the gas distribution plate (), at least one circumferential gas-flow groove () around its axis and a plurality of radial gas-flow grooves () communicating with the at least one circumferential gas-flow groove () is arranged. A plurality of axial viahole () are formed in the at least one circumferential gas-flow groove () and the plurality of radial gas-flow grooves (). The gas distribution apparatus can achieve a uniform gas distribution in the plasma processing equipment.