The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Mar. 22, 2012
Douglas M. Nelson, Curtice, OH (US);
Ian R. Williams, West Lancashire, GB;
Michel J. Soubeyrand, Holland, OH (US);
David A. Strickler, Toledo, OH (US);
Kevin D. Sanderson, Wigan, GB;
Yasunori Seto, Osaka, JP;
Keiko Tsuri, Osaka, JP;
Douglas M. Nelson, Curtice, OH (US);
Ian R. Williams, West Lancashire, GB;
Michel J. Soubeyrand, Holland, OH (US);
David A. Strickler, Toledo, OH (US);
Kevin D. Sanderson, Wigan, GB;
Yasunori Seto, Osaka, JP;
Keiko Tsuri, Osaka, JP;
Pilkington Group Limited, St. Helens, GB;
Abstract
The invention relates to an apparatus for depositing thin film coatings on a substrate. The deposition apparatus is designed to keep gaseous reactant materials to be deposited apart from one another in the deposition apparatus, by one or more separation devices and/or methods, but nevertheless, to allow the chemical reactants to mix and react at or near the substrate surface, rapidly enough to create a uniform film at commercially viable deposition rates.