The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Nov. 04, 2015
Applicants:
Young I. Cho, Cherry Hill, NJ (US);
Daniel J. Cho, Wayne, PA (US);
Alexander Fridman, Philadelphia, PA (US);
Hyoungsup Kim, Lansdowne, PA (US);
Inventors:
Young I. Cho, Cherry Hill, NJ (US);
Daniel J. Cho, Wayne, PA (US);
Alexander Fridman, Philadelphia, PA (US);
Hyoungsup Kim, Lansdowne, PA (US);
Assignee:
Drexel University, Philadelphia, PA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/46 (2006.01); H05H 1/52 (2006.01); C02F 1/32 (2006.01);
U.S. Cl.
CPC ...
C02F 1/4608 (2013.01); H05H 1/52 (2013.01); C02F 1/32 (2013.01); C02F 2303/04 (2013.01); H05H 2245/121 (2013.01);
Abstract
A plasma spark discharge reactor for treating water. The plasma spark discharge reactor comprises a HV electrode with a head and ground electrode that surrounds at least a portion of the HV electrode. A passage for gas may pass through the reactor to a location proximate to the head to provide controlled formation of gas bubbles in order to facilitate the plasma spark discharge in a liquid environment.