The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Feb. 28, 2014
Microfabrica Inc., Van Nuys, CA;
Ananda H. Kumar, Fremont, CA (US);
Jorge S. Albarran, Santa Clarita, CA (US);
Adam L. Cohen, Dallas, TX (US);
Kieun Kim, Pasadena, CA (US);
Michael S. Lockard, Lake Elizabeth, CA (US);
Uri Frodis, Los Angeles, CA (US);
Dennis R. Smalley, Newhall, CA (US);
Microfabrica Inc., Van Nuys, CA (US);
Abstract
Electrochemical fabrication processes and apparatus for producing single layer or multi-layer structures where each layer includes the deposition of at least two materials and wherein the formation of at least some layers includes operations for reducing stress and/or curvature distortion when the structure is released from a sacrificial material which surrounded it during formation and possibly when released from a substrate on which it was formed. Six primary groups of embodiments are presented which are divide into eleven primary embodiments. Some embodiments attempt to remove stress to minimize distortion while others attempt to balance stress to minimize distortion.