The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2017

Filed:

Nov. 26, 2013
Applicant:

L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;

Inventors:

Luiz Rodrigues, Florianópolis, BR;

Maicon Renan Neryz, Sao Paolo, BR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 37/00 (2006.01); B23K 35/38 (2006.01); H05K 3/34 (2006.01); B23K 3/08 (2006.01); B23K 1/00 (2006.01); B23K 1/012 (2006.01);
U.S. Cl.
CPC ...
B23K 35/383 (2013.01); B23K 1/0016 (2013.01); B23K 1/012 (2013.01); B23K 3/082 (2013.01); B23K 35/38 (2013.01); H05K 3/34 (2013.01); H05K 3/3494 (2013.01); H05K 2203/086 (2013.01); H05K 2203/16 (2013.01); H05K 2203/163 (2013.01);
Abstract

The present invention describes a portable device for monitoring and controlling the level of residual oxygen in reflow oven atmosphere (). This referred equipment is able to determine the quality of the atmosphere of a reflow oven, using parameters predetermined by the user. Therefore, the equipment performs the monitoring of the reflow oven atmosphere () controlling the level of residual oxygen of the reflow oven () by increasing or decreasing of the feed flow rate of nitrogen by the control that the microcontroller exerts over the proportional valve of nitrogen flow control (), by opening or closing the valves to kept such predetermined values.


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