The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2017

Filed:

Oct. 06, 2011
Applicants:

Ralf Oehler, Darmstadt, DE;

Harald Scholz, Rodenbach, DE;

Frank-werner Hoffmann, Büdingen, DE;

Inventors:

Ralf Oehler, Darmstadt, DE;

Harald Scholz, Rodenbach, DE;

Frank-Werner Hoffmann, Büdingen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 3/60 (2006.01); H05B 7/148 (2006.01); H05B 7/152 (2006.01);
U.S. Cl.
CPC ...
H05B 7/152 (2013.01); H05B 7/148 (2013.01); Y02P 10/256 (2015.11); Y02P 10/259 (2015.11);
Abstract

A method and a device for closed-loop control of an electrode gap in a vacuum arc furnace subjects an electrode gap of a melting electrode from the surface of a melt material to closed-loop control as a function of a droplet short-circuit rate. For this purpose, a histogram of detected droplet short-circuits is created on the basis of at least one droplet short-circuit criterion. The histogram is subdivided into sub-areas, a characteristic sub-area of the histogram is selected for closed-loop control purposes. The electrode gap is subjected to closed-loop control on the basis of the droplet short-circuits which can be associated with the selected sub-area.


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