The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2017

Filed:

Apr. 15, 2014
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventor:

Iftikhar Ahmad, Raleigh, NC (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H05B 6/80 (2006.01); H01L 21/268 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H05B 6/80 (2013.01); H01L 21/02203 (2013.01); H01L 21/02321 (2013.01); H01L 21/02345 (2013.01); H01L 21/02359 (2013.01); H01L 21/2686 (2013.01); H01L 21/67115 (2013.01); H01L 21/67167 (2013.01);
Abstract

An apparatus for thermal treatment of dielectric films on substrates comprises: a microwave applicator cavity and microwave power source; a workpiece to be heated in the cavity, comprising a porous coating on a selected substrate; and, a means of introducing a controlled amount of a polar solvent into said porous coating immediately before heating by said microwave power. The interaction of the polar solvent with the microwaves enhances the efficiency of the process, to shorten process time and reduce thermal budget. A related method comprises the steps of: depositing a porous film on a substrate; soft baking the film to a selected state of dryness; introducing a controlled amount of a polar solvent into the soft baked film; and, applying microwave energy to heat the film via interaction with the polar solvent.


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