The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2017
Filed:
Oct. 28, 2015
The Institute of Optics and Electronics, the Chinese Academy of Sciences, Chengdu, Sichuan, CN;
The Institute of Optics and Electronics, The Chinese Academy of Sciences, Chengdu, Sichuan, CN;
Abstract
The present invention discloses a dual beamsplitting element based excimer laser pulse stretching device comprising two beam splitting elements and one confocal resonator. The first beamsplitting element splits incident laser beam into two beams, one beam enters the confocal resonator, generates a certain time delay and then is incident on the second beamsplitting element, and the second beam is directly incident on the second beamsplitting element. The second beamsplitting element further splits each of the incident laser beams into two beams, one of the two beams enters the confocal resonator, generates a certain time delay and is returned back to the first beamsplitting element to be further split, and the other of the two beams is combined with other beams which are direct outputs after being split by the beamsplitting elements or being optically delayed by the confocal resonator to form a stretched output beam. The present invention may effectively enhance the efficiency of the pulse stretching, decrease the peak power of the stretched beam, and increase the lifetime of optical elements used in the excimer laser photolithography systems.