The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2017

Filed:

Aug. 13, 2014
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Hans Weber, Bayerisch Gmain, DE;

Stefan Gamerith, Villach, AT;

Franz Hirler, Isen, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 21/02 (2006.01); H03K 17/06 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 29/788 (2006.01); H01L 29/32 (2006.01); H01L 29/417 (2006.01); H01L 29/06 (2006.01); H01L 29/10 (2006.01); H01L 29/167 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7827 (2013.01); H01L 21/02365 (2013.01); H01L 29/0634 (2013.01); H01L 29/404 (2013.01); H01L 29/407 (2013.01); H01L 29/66666 (2013.01); H01L 29/66712 (2013.01); H01L 29/7802 (2013.01); H01L 29/788 (2013.01); H01L 29/7813 (2013.01); H01L 29/7816 (2013.01); H01L 29/7841 (2013.01); H03K 17/06 (2013.01); H01L 29/0623 (2013.01); H01L 29/1095 (2013.01); H01L 29/167 (2013.01); H01L 29/32 (2013.01); H01L 29/41766 (2013.01);
Abstract

A semiconductor device includes a semiconductor body and a source metallization arranged on a first surface of the body. The body includes: a first semiconductor layer including a compensation-structure; a second semiconductor layer adjoining the first layer, comprised of semiconductor material of a first conductivity type and having a doping charge per horizontal area lower than a breakdown charge per area of the semiconductor material; a third semiconductor layer of the first conductivity type adjoining the second layer and comprising at least one of a self-charging charge trap, a floating field plate and a semiconductor region of a second conductivity type forming a pn-junction with the third layer; and a fourth semiconductor layer of the first conductivity type adjoining the third layer and having a maximum doping concentration higher than that of the third layer. The first semiconductor layer is arranged between the first surface and the second semiconductor layer.


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